Semiconductor Glossary, Developed Semi OneSource.
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Term (Index) Definition
vertical furnace  furnace in which process tube is located vertically, i.e. boat with wafers moves up and down; used in semiconductor processing for oxidation, CVD, diffusion and anneals; batch process; superior to horizontal furnace in terms of the foot print in the clean room, compatibility with automated wafer loading, and heating uniformity.
horizontal furnace  furnace in which process tube is located horizontally, i.e. parallel to the ground; used in semiconductor processing for oxidation, CVD, diffusion and anneals; batch process; inferior to vertical furnace in terms of the foot print, wafer loading automation, and heating uniformity.
furnace  tool used in semiconductor device manufacturing to process wafers at high temperature in the ambient of strictly controlled composition; uses heavy heating coils, and hence, does not allow rapid changes of wafer temperature; high thermal budget process; RTP is a low thermal budget alternative.
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Created and operated by J. Ruzyllo. Copyright J. Ruzyllo 2001-2016. All rights reserved.

Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.