Semiconductor Glossary, Developed Semi OneSource.
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With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.


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Including some 500 new terms defined and remaining terms updated and modified, a 2nd edition book version of this glossary is now available.


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Term (Index) Definition
variable shape beam  scanning mode in e-beam lithography in which shape of the beam is changing depending on the geometry of exposed area.
raster scan  scanning mode in which beam is moving back and forth over the entire substrate; beam is turned on over designated area and then turned off until it will arrive at the next designated area.
vector scan  scanning mode in which beam is scanning selected areas only; after scanning of selected area is completed beam is turned off and moved to another area to be scanned.
Fixed Shape Beam, FSB  as opposed to variable shape beam; technical concept in the area of e-beam lithoraphy.
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Jerzy Ruzyllo is a Distinguished Professor Emeritus in the Department of Electrical Engineering at Penn State University.



This book gives a complete account of semiconductor engineering covering semiconductor properties, semiconductor materials, semiconductor devices and their uses, process technology, fabrication processes, and semiconductor materials and process characterization.


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Created and operated by J. Ruzyllo. Copyright J. Ruzyllo 2001-2016. All rights reserved.

Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.