Semiconductor Glossary, Developed Semi OneSource.
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Term (Index) Definition
target  source material used during sputter deposition; typically in the form of high purity disc installed in the sputtering system in such way that it is directly exposed to plasma.
sputtering, sputter deposition  bombardment of solid (target) by high energy chemically inert ions (e.g. Ar+)extracted from plasma; causes ejection of atoms from the target which are then re-deposited on the surface of the substrate purposely located in the vicinity of the target; common method of Physical Vapor Deposition (PVD) of metals and oxides.
Term (Index) Definition
sputtering target  source material during sputter deposition processes; typically in the form of the disc which inside vacuum chamber is exposed to bombarding ions.
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Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.