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With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.


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Including some 500 new terms defined and remaining terms updated and modified, a 2nd edition book version of this glossary is now available.


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Term (Index) Definition
tantalum pentoxide, Ta2O5  oxide featuring dielectric constant k ~ 25 ("high-k" dielectric); energy gap Eg=4.2 eV; considered as an alternative to SiO2 dielectric for next generation CMOS devices; not any longer, however, due to the lack of thermal stability with silicon which makes its deposition on Si substrate without formation of an excessive interfacial SiOx impossible.
high-k dielectric  dielectric material featuring dielectric constant k higher than 3.9 which is k of SiO2; used as gate dielectric (amorphous) in MOS devices and in storage capacitors; high k increases capacitance, or keeps in unchanged at the reduced area of MOS gate and gate dielectric sufficiently thick to prevent excessive tunneling current.

Reference: See Semiconductor Notes for more information
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Jerzy Ruzyllo is a Distinguished Professor Emeritus in the Department of Electrical Engineering at Penn State University.



This book gives a complete account of semiconductor engineering covering semiconductor properties, semiconductor materials, semiconductor devices and their uses, process technology, fabrication processes, and semiconductor materials and process characterization.


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Created and operated by J. Ruzyllo. Copyright J. Ruzyllo 2001-2016. All rights reserved.

Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.