Semiconductor Glossary, Developed Semi OneSource.

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With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.


Including some 500 new terms defined and remaining terms updated and modified, a 2nd edition book version of this glossary is now available.

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Term (Index) Definition
step and repeat projection  resist exposure mode in lithographic processes in which the same pattern is projected on the surface of the wafer in the series of consecutive exposures instead of the exposure of the entire wafer.
stepper  resist exposure tool commonly used in photolithograhy; works using projection printing; in contrast to full-field exposure tools stepper exposes through the remotely located reticle only part of the wafer and repeats the process ("step-and-repeat") as many time as needed to expose entire wafer.
full-field exposure  exposure of the entire wafer during photolithography processes through properly designed mask; used in contact and proximity printing; as oposed to step-and-repeat exposurep process used in steppers.
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Jerzy Ruzyllo is a Distinguished Professor Emeritus in the Department of Electrical Engineering at Penn State University.

This book gives a complete account of semiconductor engineering covering semiconductor properties, semiconductor materials, semiconductor devices and their uses, process technology, fabrication processes, and semiconductor materials and process characterization.

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Created and operated by J. Ruzyllo. Copyright J. Ruzyllo 2001-2016. All rights reserved.

Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.