Semiconductor Glossary, Developed Semi OneSource.
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Term (Index) Definition
soft bake  low temperature (<100 oC)bake to which wafer is subjected after deposition of photoresist; aimed at volatilization of solvents in the resist and its solidification; typically carried out using hot plate in ambient air.
hard bake  annealing step performed after resist developing and before etching; aimed at strengthening of resist structure prior to etching; temperature of hard bake varies depending on the resist but is always lower than 200 oC.
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