Semiconductor Glossary, Developed Semi OneSource.
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Term (Index) Definition
scrub, scrubbing  removal of heavy contaminants from the wafer surface by means of mechanical interactions (brush scrubbing); used primarily after chemical-mechanical planarization (CMP) operations.
brush scrubbing  cleaning of semiconductor surfaces using rotating brushes; used to remove heavy residues which cannot be removed without mechanical interactions; used in post-CMP wafer cleaning.
cleaning  process of removing contaminants (particles as well as metallic and organic) from the surface of the wafer; can be implemented using liquid chemicals (wet cleaning) of gases (dry cleaning).

Reference: Akrion, Inc.
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