Semiconductor Glossary, Developed Semi OneSource.
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Term (Index) Definition
reticle  square quartz plate with pattern delineated in thin chrome layer on one side; functionally same as mask; term commonly used in the case of projection printing (stepper).
mask  device used to shape desired geometries on the surface of the wafer; Examples: (i)photomask; allows selective irradiation of resist on the wafer surface by blocking irradiation in selected areas; consist of opaque (non-transparent to given wavelengths) and blank (transparent) parts; in photolithography chrome, and quartz respectively; (ii)mechanical (shadow) mask; a thin sheet of metal with properly shaped holes; sometimes used to define crude geometries on the surface of the wafer during physical vapor depositions.
projection printing  exposure technique used in photolithography in which mask (reticle) image is projected on the surface of the wafer through the complex system of image correcting lenses (think of an old fashion slide projector in which slide is the mask and screen is a surface of the wafer); assures the highest resolution among all exposure methods; implemented using steppers in which resist on the surface of the wafer is exposed step-by-step (step and repeat process) as opposed to full-field exposure in which the entire wafer is exposed in one shot.

Reference: See Semiconductor Notes for more information
stepper  resist exposure tool commonly used in photolithograhy; works using projection printing; in contrast to full-field exposure tools stepper exposes through the remotely located reticle only part of the wafer and repeats the process ("step-and-repeat") as many time as needed to expose entire wafer.
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