Semiconductor Glossary, Developed Semi OneSource.
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Term (Index) Definition
photostabilization of resist  process performed after developing and hard-baking of resist and before etching or implantation; involves UV irradiation combined with low-temperature (<200 oC) heating; prevents erosion of resist and outgasing from the resist during subsequent processes.
resist  material sensitive to irradiation i.e. changes its chemical properties when irradiated; in the form of thin film used as a pattern transfer layer in lithographic processes in semiconductor manufacturing.
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Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.