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Term (Index) Definition
phase shift mask, PSM  a conventional mask to which layer of material featuring desired refractive index and thickness is locally added in order to shift phase of light passing through transparent portion of the mask; phase shifting increases resolution of pattern transfer by destructive interference preventing resist exposure in the regions in which it should not be exposed.
mask  device used to shape desired geometries on the surface of the wafer; Examples: (i)photomask; allows selective irradiation of resist on the wafer surface by blocking irradiation in selected areas; consist of opaque (non-transparent to given wavelengths) and blank (transparent) parts; in photolithography chrome, and quartz respectively; (ii)mechanical (shadow) mask; a thin sheet of metal with properly shaped holes; sometimes used to define crude geometries on the surface of the wafer during physical vapor depositions.
mask, photolithography  see photomask
enhancement techniques  term typically refers to techniques employed to extend use of photolithography into sub-100 nm regime; e.g., phase-shift masks, immersion photolithography, new photoresist formulations, etc.
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