Semiconductor Glossary, Developed Semi OneSource.
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Term (Index) Definition
ozone  gas comprising of three oxygens, O3, formed during the reaction of atomic oxygen, O, with molecular oxygen, O2; very strong oxidizing agent; in semiconductor processing used as a gas in "dry" processes or as a gas dissolved in deionized water to form ozonated water commonly used in wafer cleaning operations.
ozonated water  water with ozone dissolved in it to increase its oxidizing strength; commonly used in semiconductor processing to remove organic contaminants from the wafer surface.
UV/ozone  dry cleaning process used to remove organic contaminants from the surfaces of solids such as semiconductor wafers and masks; UV rradiation in the ambient containing oxygen generates ozone which is a very strong oxidizing agent; spectrum of UV light used should contain 185 nm and 254 nm wavelengths.
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Created and operated by J. Ruzyllo. Copyright J. Ruzyllo 2001-2016. All rights reserved.

Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.