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Term (Index) Definition
opaque material  part of the mask which is not transparent to radiation used for resist exposure; different opaque materials are used in photolithography and X-ray lithography.
blank  part of the mask transparent to radiation featuring given wavelength; different blanks are used in photolithography and X-ray lithography.
mask  device used to shape desired geometries on the surface of the wafer; Examples: (i)photomask; allows selective irradiation of resist on the wafer surface by blocking irradiation in selected areas; consist of opaque (non-transparent to given wavelengths) and blank (transparent) parts; in photolithography chrome, and quartz respectively; (ii)mechanical (shadow) mask; a thin sheet of metal with properly shaped holes; sometimes used to define crude geometries on the surface of the wafer during physical vapor depositions.
mask, X-ray lithography  see X-ray mask.
photomask  mask used in photolithography to block resist exposure to UV radiation in selected areas; consists of chrome opaque areas supported by high quality quartz plate transparent to UV radiation.
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