Semiconductor Glossary, Developed Semi OneSource.

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With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.


Including some 500 new terms defined and remaining terms updated and modified, a 2nd edition book version of this glossary is now available.

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Term (Index) Definition
multiple patterning  an approach to patterning of features in advanced ICs which are 32 nm half-pitch and below; allows an increase of feature density without having to improve resolution of the pattern transfer process; double patterning is the most common version of multiple patterning; in conjunction with immersion photolithography extends applicability of 193 nm exposure tools.
immersion lithography  photolithography techniques in which space between the final projection lens and the wafer in the exposure tool is filled with water rather than air; use of medium featuring higher refractive index n ( n=1 for air while n=1.44 for water) increases numerical aperture (NA) of the optical lithography tool, and hence, increases resolution of the pattern transfer process.

Reference: See Semiconductor Notes for more information
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Jerzy Ruzyllo is a Distinguished Professor Emeritus in the Department of Electrical Engineering at Penn State University.

This book gives a complete account of semiconductor engineering covering semiconductor properties, semiconductor materials, semiconductor devices and their uses, process technology, fabrication processes, and semiconductor materials and process characterization.

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Created and operated by J. Ruzyllo. Copyright J. Ruzyllo 2001-2016. All rights reserved.

Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.