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With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.


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Including some 500 new terms defined and remaining terms updated and modified, a 2nd edition book version of this glossary is now available.


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Term (Index) Definition
multilayer resist  in order to improve resolution of the pattern transfer process more than one layer of resist are used; in the simple version of such scheme bottom (thicker) layer planarizes surface while top (very thin)layer acts as an imaging resist .
planarization  process of flatting of the surface of the wafer; done either by deposition of additional material and back polishing it, or by deposition and re-flowing of SiO2 doped with P and B (BPSG), or by depositing thick layer of resist.
imaging resist  layer of photoresist in which photochemical reactions resulting from irradiation are taking place; as the wavelength of radiation is getting shorter, and hence absorption coefficient increases, thickness of imaging resit is gradually reduced.
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Jerzy Ruzyllo is a Distinguished Professor Emeritus in the Department of Electrical Engineering at Penn State University.



This book gives a complete account of semiconductor engineering covering semiconductor properties, semiconductor materials, semiconductor devices and their uses, process technology, fabrication processes, and semiconductor materials and process characterization.


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Created and operated by J. Ruzyllo. Copyright J. Ruzyllo 2001-2016. All rights reserved.

Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.