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Term (Index) Definition
megasonic agitation, megasonic scrubbing  used to enhance particle removal from wafer surface by sonic pressure; megasonic energy at the frequency in 500-1000 kHz range is applied to the liquid (typically APM cleaning solution) in which wafers are immersed; more effective and less potentially damaging to the wafer (reduced cavitation) than ultrasonic agitation; standard feature in the immersion cleaning tools.

Reference: Akrion, Inc.
sonic wave  generated by megasonic agitation during wet cleaning operations; used to increase efficiency of particle removal from thewafer surface.
immersion cleaning  cleaning process in which wafers and cassette are completely immersed in cleaning solutions; as opposed to, for instance, spray cleaning or spin cleaning.

Reference: Akrion, Inc.
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