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Term (Index) Definition
maskless lithography,  lithographic process in which pattern in the resist is exposed by direct writing with computer driven electron beam rather than by exposure through the mask.
electron beam (e-beam) lithography, EBL  lithography technique which uses focused beam of electrons to expose the resist; no mask is used as pattern is "written" directly into the resist by very fast scanning of electron beam; pattern transfer resolution below 100 nm; resolution is limited by the proximity effect; EBL is commonly used to manufacture high resolution masks for photolithography and X-ray lithography.
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