Semiconductor Glossary, Developed Semi OneSource.
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Term (Index) Definition
low-pressure mercury (Hg) lamp  source of UV radiation featuring spectrum that includes high intensity lines shorter than 500 nm; used in less advanced photolithgographic processes.
exposure  irradiation of resist with radiation of adequate wavelength (UV in the case of photolithography) for the purpose of stimulating desired photo-chemical reactions in the layer of resist.
photoresist  photo-sensitive material used in photolithography to transfer pattern from the mask onto the wafer; a liquid deposited on the surface of the wafer as a thin film then solidified by low temperature anneal; in the areas in which photoresist can be reached by UV radiation photochemical reactions change its properties, specifically, solubility in the developer; two types of photoresist: positive and negative.
UV, ultraviolet  radiation in the electromagnetic spectrum featuring wavelength in the range from about 150 nm to about 400 nm (corresponding energy in the range from about 8.2 eV to about 3.1 eV); carries enough energy to stimulate photochemical reactions in solids and/or gases in semiconductor processing.
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