Semiconductor Glossary, Developed Semi OneSource.

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With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.

Including some 500 new terms defined and remaining terms updated and modified, a 2nd edition book version of this glossary is now available.

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Term (Index) Definition
low-k dielectric  dielectric material featuring dielectric constant k lower than 3.9 which is k of SiO2; used to insulate adjacent metal lines (interlayer dielectric, ILD) in advanced integrated circuits; low k reduces undesired capacitive coupling, and hence "cross talk", between lines.

Reference: SemiOneSource,Notes
interconnect  conductor (typically metal) line connecting elements of an integrated circuit; in very high density integrated circuits interconnect lines form multilevel network; in advanced silicon ICs interconnect lines as are made out of copper.
porous dielectric  porosity (air gaps) is created in ILD (Inter-Layer Dielectric)to reduce its dielectric constant.
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Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.