Semiconductor Glossary, Developed Semi OneSource.
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With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.












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Term (Index) Definition
leakage current  uncontrolled ("parasitic") current flowing across region(s) of semiconductor structure/device in which no current should be flowing; e.g. current flowing across the gate oxide in MOS structure.
p-n junction  p-type and n-type semiconductors are brought to contact in order to create a potential barrier; height of the potential barrier is controlled by the voltage applied between p- and n-type regions; in homojunctions p- and n-type regions are formed in the same semiconductor typically by locally changing its doping from p to n, or vice versa; in heterojunctions p- and n-type regions are made out of different semicodnuctors.
reverse bias  bias at which potential barrier ar the p-n or metal-semiconductor junction is increased and currenet flow from one region to another is restricted.
gate oxide  a layer of very thin oxide sandwiched between semiconductor and gate contact in MOS devices; can be as thin as 1 nm in advance silicon digital integrated circuits and as thick as 70 nm in discrete power MOSFETs; typically thermally grown SiO2, often nitrided; in ultra-small geometry CMOS ICs SiO2 can be replaced with dielectrics fetauring higher than SiO2 dielectric constant.
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Created and operated by J. Ruzyllo. Copyright J. Ruzyllo 2001-2016. All rights reserved.

Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.