Semiconductor Glossary, Developed Semi OneSource.
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With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.


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Including some 500 new terms defined and remaining terms updated and modified, a 2nd edition book version of this glossary is now available.


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Term (Index) Definition
lamp cleaning  brief exposure of semiconductor wafer to halogen-quartz lamp illumination in oxygen containing ambient for the purpose of increasing wafer temperature up to 300 oC resulting in volatilization of surface organic contaminants.

Reference: SemiOneSource,Notes
organic contaminant  in semiconductor processing mainly hydrocarbons from resist/etching processes, ambient air, storage environment, shipping boxes, etc.; if not controlled may cause reliability problems in MOS devices as well as have an adverse effect on the characteristics of metal-semiconductor contacts and epitaxial layers; removal accomplished using strongly oxidizing ambient both wet and dry.
RTC  Rapid Thermal Cleaning; brief increase of wafer temperature for a purpose of volatilization of surface contaminants, (primarily organics)and moisture; typically carried out at temperatures below 300 o in oxidizing ambient, e.g. air, at atmospheric pressure.
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Jerzy Ruzyllo is a Distinguished Professor Emeritus in the Department of Electrical Engineering at Penn State University.



This book gives a complete account of semiconductor engineering covering semiconductor properties, semiconductor materials, semiconductor devices and their uses, process technology, fabrication processes, and semiconductor materials and process characterization.


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Created and operated by J. Ruzyllo. Copyright J. Ruzyllo 2001-2016. All rights reserved.

Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.