Semiconductor Glossary, Developed Semi OneSource.

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With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.


Including some 500 new terms defined and remaining terms updated and modified, a 2nd edition book version of this glossary is now available.

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Term (Index) Definition
ion beam  geometrically confined and accelerated by electrostatic forces stream of ions directed toward desired target.
ion sputtering, milling  etching process; process in which high energy ions impinging on the surface of the solid cause ejection ("sputtering") of the host atoms; highly anisotropic and non-selective etching.
Term (Index) Definition
ion beam lithography, IBL  lithography technique in which resist is exposed by accelerated ions; due to the limited scattering of ions in the resist IBL may offer higher resolution than e-beam lithography.
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Jerzy Ruzyllo is a Distinguished Professor Emeritus in the Department of Electrical Engineering at Penn State University.

This book gives a complete account of semiconductor engineering covering semiconductor properties, semiconductor materials, semiconductor devices and their uses, process technology, fabrication processes, and semiconductor materials and process characterization.

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Created and operated by J. Ruzyllo. Copyright J. Ruzyllo 2001-2016. All rights reserved.

Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.