Semiconductor Glossary, Developed Semi OneSource.
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Term (Index) Definition
immersion cleaning  cleaning process in which wafers and cassette are completely immersed in cleaning solutions; as opposed to, for instance, spray cleaning or spin cleaning.

Reference: Akrion, Inc.
wet bench  typically fully automatic process tool used to carry out wet cleaning and etching operations in semiconductor processing; commonly includes several tanks each containing either cleaning/etching solution or deionized rinsing water in which wafers are immersed in predetermined sequence; typically includes also drying module.

Reference: Akrion, Inc. SemiOneSource,Notes
spin cleaning  so-called "dynamic cleaning"; wafer rotated at high rpm's is subjected to interactions with cleaning solutions and DI water; single wafer process.

Reference: See Semiconductor Notes for more information
spray cleaning  batch wet cleaning process in which processed wafers are sprayed with cleaning chemicals and then rinsing water; alternative to immersion cleaning, spin cleaning, etc.

Reference: SemiOneSource,Notes, SN-17
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