Semiconductor OneSource: Semiconductor Glossary -- Search For : i

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Term (Index)	Definition
i - line lithography	photolithography using 365 nm wavelength UV radiation for exposure; (high-intensity line at 436 nm in the spectrum of UV lamp is referred to as "i-line").
g - line lithography	photolithography using 436 nm wavelength UV radiation for exposure; (high-intensity line at 436 nm in the spectrum of UV lamp is referred to as "g-line").

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