Semiconductor Glossary, Developed Semi OneSource.
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Term (Index) Definition
gate injection  during constant-current stress of MOS gate stacks electrons are injected into the oxide from the gate contact.
constant - current stress, CCS  technique used to study time dependent breakdown of gate oxide; constant current featuring predetermined density is injected into the oxide until it breaks down (gate voltage drops to zero).
substrate injection  during constant-current stress of MOS gate stacks electrons are injected into the oxide from the Si substrate.
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Created and operated by J. Ruzyllo. Copyright J. Ruzyllo 2001-2016. All rights reserved.

Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.