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Term (Index) Definition
furnace  tool used in semiconductor device manufacturing to process wafers at high temperature in the ambient of strictly controlled composition; uses heavy heating coils, and hence, does not allow rapid changes of wafer temperature; high thermal budget process; RTP is a low thermal budget alternative.
Term (Index) Definition
furnace horizontal  furnace for high temperature processing of semiconductor wafers in which process tube is positioned horizontally and wafers are located in the boat vertically on their edges; used for thermal oxidation, CVD, diffusion, and anneals; batch processor; an alternative configuration: vertical furnace.
batch process  process in which several wafers are processed at the same time; opposite to single wafer process; e.g. thermal oxidation in the furnace (either horizontal or vertical) is a prime example of the batch process.
furnace vertical  furnace for high temperature processing of semiconductor wafers in which process tube is positioned vertically and wafers are located horizontally inside the tube; superior to horizontal furnace in terms of heating uniformity, compatible with automatic wafer loading and footprint; warpage of horizontally supported wafers must be prevented; batch processor.
Term (Index) Definition
furnace vertical  furnace for high temperature processing of semiconductor wafers in which process tube is positioned vertically and wafers are located horizontally inside the tube; superior to horizontal furnace in terms of heating uniformity, compatible with automatic wafer loading and footprint; warpage of horizontally supported wafers must be prevented; batch processor.
furnace horizontal  furnace for high temperature processing of semiconductor wafers in which process tube is positioned horizontally and wafers are located in the boat vertically on their edges; used for thermal oxidation, CVD, diffusion, and anneals; batch processor; an alternative configuration: vertical furnace.
Term (Index) Definition
horizontal furnace  furnace in which process tube is located horizontally, i.e. parallel to the ground; used in semiconductor processing for oxidation, CVD, diffusion and anneals; batch process; inferior to vertical furnace in terms of the foot print, wafer loading automation, and heating uniformity.
vertical furnace  furnace in which process tube is located vertically, i.e. boat with wafers moves up and down; used in semiconductor processing for oxidation, CVD, diffusion and anneals; batch process; superior to horizontal furnace in terms of the foot print in the clean room, compatibility with automated wafer loading, and heating uniformity.
Term (Index) Definition
vertical furnace  furnace in which process tube is located vertically, i.e. boat with wafers moves up and down; used in semiconductor processing for oxidation, CVD, diffusion and anneals; batch process; superior to horizontal furnace in terms of the foot print in the clean room, compatibility with automated wafer loading, and heating uniformity.
horizontal furnace  furnace in which process tube is located horizontally, i.e. parallel to the ground; used in semiconductor processing for oxidation, CVD, diffusion and anneals; batch process; inferior to vertical furnace in terms of the foot print, wafer loading automation, and heating uniformity.
furnace  tool used in semiconductor device manufacturing to process wafers at high temperature in the ambient of strictly controlled composition; uses heavy heating coils, and hence, does not allow rapid changes of wafer temperature; high thermal budget process; RTP is a low thermal budget alternative.
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