Semiconductor Glossary, Developed Semi OneSource.
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Term (Index) Definition
fluorine, F2  halogen gas; highly reactive and very toxic; fluorine is an important component of etching media in Si processing; e.g. gases NF3, CF4, and several others; liquid chemicals: HF (etchant of SiO2); fluorine catalyzes breaking of Si-Si and Si-O bonds.
Term (Index) Definition
fluorine, F2, excimer laser  wavelength of emitted radiation 157 nm; suitable for exposure of sub-100 nm patterns problem: low maximum output power of 6 mJ/pulse.
excimer laser  chemical laser; laser capable of generating very short wavelength (below 200 nm) UV radiation; e.g. KrF (248 nm), ArF (193 nm), F2 (157 nm); commonly used as a source of UV radiation in very-high resolution photolithography.
KrF excimer laser  248 nm wavelength excimer laser used in photolithography; suitable for exposing 180 nm geometries.
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Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.