Semiconductor Glossary, Developed Semi OneSource.

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With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.


Including some 500 new terms defined and remaining terms updated and modified, a 2nd edition book version of this glossary is now available.

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Term (Index) Definition
fluorine, F2  halogen gas; highly reactive and very toxic; fluorine is an important component of etching media in Si processing; e.g. gases NF3, CF4, and several others; liquid chemicals: HF (etchant of SiO2); fluorine catalyzes breaking of Si-Si and Si-O bonds.
Term (Index) Definition
fluorine, F2, excimer laser  wavelength of emitted radiation 157 nm; suitable for exposure of sub-100 nm patterns problem: low maximum output power of 6 mJ/pulse.
excimer laser  chemical laser; laser capable of generating very short wavelength (below 200 nm) UV radiation; e.g. KrF (248 nm), ArF (193 nm), F2 (157 nm); commonly used as a source of UV radiation in very-high resolution photolithography.
KrF excimer laser  248 nm wavelength excimer laser used in photolithography; suitable for exposing 180 nm geometries.
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Jerzy Ruzyllo is a Distinguished Professor Emeritus in the Department of Electrical Engineering at Penn State University.

This book gives a complete account of semiconductor engineering covering semiconductor properties, semiconductor materials, semiconductor devices and their uses, process technology, fabrication processes, and semiconductor materials and process characterization.

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Created and operated by J. Ruzyllo. Copyright J. Ruzyllo 2001-2016. All rights reserved.

Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.