Semiconductor Glossary, Developed Semi OneSource.
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With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.


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Including some 500 new terms defined and remaining terms updated and modified, a 2nd edition book version of this glossary is now available.


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Term (Index) Definition
field oxide, FOX  relatively thick oxide (typically 100 - 500 nm) formed to passivate and protect semiconductor surface outside of active device area; part of any semiconductor device, but does not participate in device operation.
wet oxidation  thermal oxidation of silicon carried out in water vapor containing oxygen, or in steam; significantly higher oxide growth rate as compared to dry oxidation; used to form relatively thick films of SiO2 on Si surface; wet oxide contains Si-H and Si-OH, and hence, features inferior to dry oxide electrical integrity.
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Jerzy Ruzyllo is a Distinguished Professor Emeritus in the Department of Electrical Engineering at Penn State University.



This book gives a complete account of semiconductor engineering covering semiconductor properties, semiconductor materials, semiconductor devices and their uses, process technology, fabrication processes, and semiconductor materials and process characterization.


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Created and operated by J. Ruzyllo. Copyright J. Ruzyllo 2001-2016. All rights reserved.

Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.