Semiconductor Glossary, Developed Semi OneSource.

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With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.


Including some 500 new terms defined and remaining terms updated and modified, a 2nd edition book version of this glossary is now available.

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Term (Index) Definition
field oxide, FOX  relatively thick oxide (typically 100 - 500 nm) formed to passivate and protect semiconductor surface outside of active device area; part of any semiconductor device, but does not participate in device operation.
wet oxidation  thermal oxidation of silicon carried out in water vapor containing oxygen, or in steam; significantly higher oxide growth rate as compared to dry oxidation; used to form relatively thick films of SiO2 on Si surface; wet oxide contains Si-H and Si-OH, and hence, features inferior to dry oxide electrical integrity.
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Jerzy Ruzyllo is a Distinguished Professor Emeritus in the Department of Electrical Engineering at Penn State University.

This book gives a complete account of semiconductor engineering covering semiconductor properties, semiconductor materials, semiconductor devices and their uses, process technology, fabrication processes, and semiconductor materials and process characterization.

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Created and operated by J. Ruzyllo. Copyright J. Ruzyllo 2001-2016. All rights reserved.

Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.