Semiconductor Glossary, Developed Semi OneSource.
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Term (Index) Definition
faceting  distortion of the pattern subjected to sputtering; results from the fact that sputtering yield depends on the angle of incidence of ions impinging on the surface.
sputtering, sputter deposition  bombardment of solid (target) by high energy chemically inert ions (e.g. Ar+)extracted from plasma; causes ejection of atoms from the target which are then re-deposited on the surface of the substrate purposely located in the vicinity of the target; common method of Physical Vapor Deposition (PVD) of metals and oxides.
sputter yield  efficiency of the sputtering process; different for different materials.
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