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Term (Index) Definition
external, extrinsic gettering  process in which gettering of contaminants and defects in semiconductor wafer is accomplished by stressing its back surface (by inducing damage or depositing material featuring different than semiconductor thermal expansion coefficient) and then subjecting wafer to thermal treatment; contaminants and/or defects are relocated toward back surface and away from the front surface where so-called "denuded zone" is formed as a result.
denuded zone, DZ  very thin region in semiconductor substrate adjacent to its surface cleared from contaminants and/or defects by gettering; devices are built into denuded zone.
gettering  process which moves contaminants and/or defects in semiconductor into its bulk and away from its top surface and traps them there; creates "denuded zone" at the top surface.

Reference: See more on gettering
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