Semiconductor Glossary, Developed Semi OneSource.

Check out the new weBLOG!

Semiconductor Glossary book, click here to see new prices!

With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.


Including some 500 new terms defined and remaining terms updated and modified, a 2nd edition book version of this glossary is now available.

Search For Term

Term (Index) Definition
dual damascene  modified version of the damascene process which is used to form metal interconnect geometry using CMP process instead of metal etching; in dual damascene two interlayer dielectric patterning steps and one CMP step create a pattern which would require two patterning steps and two metal CMP steps when using conventional damscene process.
damascene   process in which interconnect metal lines are delineated in dielectrics isolating them from each other not by means of lithography and etching, but by means of chemical-mechanical planarization (CMP); in this process interconnect pattern is first lithographically defined in the layer of dielectric then metal is deposited to fill resulting trenches and then excess metal is removed by means of chemical-mechanical polishing (planarization).
CMP  Chemical Mechanical Polishing, Chemical Mechanical Planarization, method of removing layers of solid by chemical-mechanical polishing carried out for the purpose of surface planarization and definition of metal interconnect pattern; key process in back-end of line IC manufacturing.
Hit Count=

Back To Top! 

Back To Home!

Jerzy Ruzyllo is a Distinguished Professor Emeritus in the Department of Electrical Engineering at Penn State University.

This book gives a complete account of semiconductor engineering covering semiconductor properties, semiconductor materials, semiconductor devices and their uses, process technology, fabrication processes, and semiconductor materials and process characterization.

Hit Count=
Created and operated by J. Ruzyllo. Copyright J. Ruzyllo 2001-2016. All rights reserved.

Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.