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Term (Index) Definition
depth of focus, DOF  one of key factors determining resolution of projection photolithography; distance along the optical axis over which features of illuminated surface are in focus.
projection printing  exposure technique used in photolithography in which mask (reticle) image is projected on the surface of the wafer through the complex system of image correcting lenses (think of an old fashion slide projector in which slide is the mask and screen is a surface of the wafer); assures the highest resolution among all exposure methods; implemented using steppers in which resist on the surface of the wafer is exposed step-by-step (step and repeat process) as opposed to full-field exposure in which the entire wafer is exposed in one shot.

Reference: See Semiconductor Notes for more information
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