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With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.


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Including some 500 new terms defined and remaining terms updated and modified, a 2nd edition book version of this glossary is now available.


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Term (Index) Definition
deionized water, DI water  ultra-pure water used in semiconductor manufacturing; produced by removing all ions of dissolved minerals using reverse osmosis and ion-exchange systems; DI water should also be free from particles, bacteria, organics, and dissolved oxygen; purity of deionized water is determined based on its resistivity; target resistivity is 18 megaohm-cm.
ozonated water  water with ozone dissolved in it to increase its oxidizing strength; commonly used in semiconductor processing to remove organic contaminants from the wafer surface.
rinsing  process in which wafer is immersed in deionized water in order to stop chemical reaction initiated during preceding operation and to remove products of this reaction from the surface.
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Jerzy Ruzyllo is a Distinguished Professor Emeritus in the Department of Electrical Engineering at Penn State University.



This book gives a complete account of semiconductor engineering covering semiconductor properties, semiconductor materials, semiconductor devices and their uses, process technology, fabrication processes, and semiconductor materials and process characterization.


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Created and operated by J. Ruzyllo. Copyright J. Ruzyllo 2001-2016. All rights reserved.

Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.