Semiconductor Glossary, Developed Semi OneSource.

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With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.

Including some 500 new terms defined and remaining terms updated and modified, a 2nd edition book version of this glossary is now available.

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Term (Index) Definition
cryogenic aerosol  high velocity frozen particles of inert gas such as CO2 or Ar; used to remove particles from the wafer surface.
particle  pieces of various materials (dust, ultra-small chips of silicon or silica, skin flakes, colonies of bacteria, etc.) present in the process environment; even ultra-small particles(<0.1 micrometer) on the Si surface may cause catastrophic damage; no effort is spared to prevent particle contamination (clean-room technology); most commonly particles are removed by an APM clean.
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Created and operated by J. Ruzyllo. Copyright J. Ruzyllo 2001-2016. All rights reserved.

Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.