Semiconductor Glossary, Developed Semi OneSource.
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With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.












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Term (Index) Definition
contamination  presence of contaminants in the process ambient and/or wafer surface.
cleaning  process of removing contaminants (particles as well as metallic and organic) from the surface of the wafer; can be implemented using liquid chemicals (wet cleaning) of gases (dry cleaning).

Reference: Akrion, Inc.
cleanroom  enclosed ultra-clean space in which semiconductor manufacturing takes place; features counts of airborne particles reduced to technically feasible minimum and strictly controlled temperature and humidity of ambient air.

Reference: See more on cleanroom technology
contamination control  prevention of penetration of process ambient by contaminants.
contaminant  alien element or specie from the medium in contact with semiconductor (e.g. process gases, liquids, clean room air, etc.) which may penetrate semiconductor or adhere to its surface and which adversely affect characteristics/performance of the processed device; the most common types of contaminants in semiconductor processing: particles, organic contaminants, and metallic contaminants.

Reference: SemiOneSource,Notes
Term (Index) Definition
contamination control  prevention of penetration of process ambient by contaminants.
cleanroom  enclosed ultra-clean space in which semiconductor manufacturing takes place; features counts of airborne particles reduced to technically feasible minimum and strictly controlled temperature and humidity of ambient air.

Reference: See more on cleanroom technology
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Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.