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Term (Index) Definition
chrome mask  mask used in photolithography which uses thin film of chrome as an opaque material; due to sharper edges, mechanical durability, and optical density of Cr superior to emulsion based photomask.
photomask  mask used in photolithography to block resist exposure to UV radiation in selected areas; consists of chrome opaque areas supported by high quality quartz plate transparent to UV radiation.
photoemulsion  material acting as an opaque (nontransparent to UV radiation) part of the masks used in photolithography; inferior to chrome, used for the same purpose, due to lower optical density (thicker film needed to block off UV radiation) grainy structure (not as sharp edges as in the case of chrome) and softness making it vulnerable to mechanical damage.
opaque material  part of the mask which is not transparent to radiation used for resist exposure; different opaque materials are used in photolithography and X-ray lithography.
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