Semiconductor Glossary, Developed Semi OneSource.

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With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.


Including some 500 new terms defined and remaining terms updated and modified, a 2nd edition book version of this glossary is now available.

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Term (Index) Definition
anhydrous HF, AHF  water-free vapor of hydrofluoric acid; used in conjunction with vapor of either water or alcoholic solvents (e.g. methanol) to etch silicon oxides on the wafer surface; oxide etch rate depends strongly on wafer temperature and vapor pressure as well as type of the oxide (e.g. thermal oxide etches much slower than TEOS oxide).

Reference: Primaxx, Inc.
oxide etching  process causing dissolution of an oxide in a liquid solution, or its volatilization in the gaseous ambient.
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Jerzy Ruzyllo is a Distinguished Professor Emeritus in the Department of Electrical Engineering at Penn State University.

This book gives a complete account of semiconductor engineering covering semiconductor properties, semiconductor materials, semiconductor devices and their uses, process technology, fabrication processes, and semiconductor materials and process characterization.

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Created and operated by J. Ruzyllo. Copyright J. Ruzyllo 2001-2016. All rights reserved.

Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.