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Term (Index) Definition
alignment  process of positioning of the mask (or reticle) in lithographic processes relative to a wafer prior to exposure of the resist.
overlay  superposition of the pattern on the mask to the pattern previously created on the surface of the wafer.
Term (Index) Definition
alignment mark  specially configured mark put on each mask in the set to allow precise alignment of the mask with pattern on the wafer.
aligner  tool allowing adequate positioning of the mask (or reticle) in lithographic processes relative to a wafer prior to exposure of the resist.
alignment  process of positioning of the mask (or reticle) in lithographic processes relative to a wafer prior to exposure of the resist.
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