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Term (Index) Definition
UV cleaning  dry cleaning process stimulated by UV radiation; e.g. volatilization of organic contaminants by UV/ozone exposure.
dry cleaning  process of contaminants removal from the wafer surface in the gas-phase; driven by either conversion of contaminant into volatile compound through chemical reaction, or its "knocking" off the surface via momentum transfer, or lift-off during slight etching of contaminated surface.

Reference: See Semiconductor Notes for more information
cleaning  process of removing contaminants (particles as well as metallic and organic) from the surface of the wafer; can be implemented using liquid chemicals (wet cleaning) of gases (dry cleaning).

Reference: Akrion, Inc.
UV/ozone  dry cleaning process used to remove organic contaminants from the surfaces of solids such as semiconductor wafers and masks; UV rradiation in the ambient containing oxygen generates ozone which is a very strong oxidizing agent; spectrum of UV light used should contain 185 nm and 254 nm wavelengths.
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