Semiconductor Glossary, Developed Semi OneSource.
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With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.












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Term (Index) Definition
UV/ozone  dry cleaning process used to remove organic contaminants from the surfaces of solids such as semiconductor wafers and masks; UV rradiation in the ambient containing oxygen generates ozone which is a very strong oxidizing agent; spectrum of UV light used should contain 185 nm and 254 nm wavelengths.
organic contaminant  in semiconductor processing mainly hydrocarbons from resist/etching processes, ambient air, storage environment, shipping boxes, etc.; if not controlled may cause reliability problems in MOS devices as well as have an adverse effect on the characteristics of metal-semiconductor contacts and epitaxial layers; removal accomplished using strongly oxidizing ambient both wet and dry.
ozone  gas comprising of three oxygens, O3, formed during the reaction of atomic oxygen, O, with molecular oxygen, O2; very strong oxidizing agent; in semiconductor processing used as a gas in "dry" processes or as a gas dissolved in deionized water to form ozonated water commonly used in wafer cleaning operations.
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Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.