Semiconductor Glossary, Developed Semi OneSource.

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With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.


Including some 500 new terms defined and remaining terms updated and modified, a 2nd edition book version of this glossary is now available.

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Term (Index) Definition
TEOS  Tetraethyl Orthosilicate, Si(OC2H5)4; gaseous compound commonly used in CVD of SiO2 processes (so-called "TEOS Oxide"); good conformality of coating; relatively inert material, liquid at room temperature; thermally decomposes at around 700 oC to form SiO2; plasma enhancement lowers temperature of deposition to below 500 oC.
conformal coating  deposited film which thickness remains the same regardless of the geometry of underlying features.
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Jerzy Ruzyllo is a Distinguished Professor Emeritus in the Department of Electrical Engineering at Penn State University.

This book gives a complete account of semiconductor engineering covering semiconductor properties, semiconductor materials, semiconductor devices and their uses, process technology, fabrication processes, and semiconductor materials and process characterization.

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Created and operated by J. Ruzyllo. Copyright J. Ruzyllo 2001-2016. All rights reserved.

Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.