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Term (Index) Definition
TEOS  Tetraethyl Orthosilicate, Si(OC2H5)4; gaseous compound commonly used in CVD of SiO2 processes (so-called "TEOS Oxide"); good conformality of coating; relatively inert material, liquid at room temperature; thermally decomposes at around 700 oC to form SiO2; plasma enhancement lowers temperature of deposition to below 500 oC.
conformal coating  deposited film which thickness remains the same regardless of the geometry of underlying features.
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