Semiconductor Glossary, Developed Semi OneSource.
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With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.


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Including some 500 new terms defined and remaining terms updated and modified, a 2nd edition book version of this glossary is now available.


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Term (Index) Definition
SRD  Spin Rinse-Dry
deionized water, DI water  ultra-pure water used in semiconductor manufacturing; produced by removing all ions of dissolved minerals using reverse osmosis and ion-exchange systems; DI water should also be free from particles, bacteria, organics, and dissolved oxygen; purity of deionized water is determined based on its resistivity; target resistivity is 18 megaohm-cm.
spin cleaning  so-called "dynamic cleaning"; wafer rotated at high rpm's is subjected to interactions with cleaning solutions and DI water; single wafer process.

Reference: See Semiconductor Notes for more information
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Jerzy Ruzyllo is a Distinguished Professor Emeritus in the Department of Electrical Engineering at Penn State University.



This book gives a complete account of semiconductor engineering covering semiconductor properties, semiconductor materials, semiconductor devices and their uses, process technology, fabrication processes, and semiconductor materials and process characterization.


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Created and operated by J. Ruzyllo. Copyright J. Ruzyllo 2001-2016. All rights reserved.

Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.