Semiconductor Glossary, Developed Semi OneSource.
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With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.












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Term (Index) Definition
RTCVD  Rapid Thermal Chemical Vapor Deposition; thermally enhanced CVD process carried out at high temperature, but for a very short time.
CVD, Chemical Vapor Deposition  Chemical Vapor Deposition is the most common thin film deposition method in advanced semiconductor manufacturing; deposited species are formed as a results of chemical reaction between gaseous reactants at elevated temperature in the vicinity of the substrate; solid product of the reaction is deposited on the surface of the substrate; used to deposit films of semiconductors (crystalline and non-crystalline), insulators as well as metals; variations of CVD processes include Atmospheric Pressure CVD (APCVD), Low Pressure CVD (LPCVD)and Plasma Enhanced CVD (EPCVD), Metal-Organic CVD (MOCVD) and others.
RTP  Rapid Thermal Processing; general term describing type of the process in which temperature of the wafer is rapidly increased by radiant heating from high-power halogen-quartz lamps; low-thermal budget process; useful in several applications in semiconductor device processing in which high temperature exposure is needed, but transfer of the large amount of thermal energy to the wafer is not desired .
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