Semiconductor Glossary, Developed Semi OneSource.
Google
 


Check out the new SemiconductorGlossary.com weBLOG!



With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.












Including some 500 new terms defined and remaining terms updated and modified, a 2nd edition book version of this glossary is now available.


Search For Term

Term (Index) Definition
Physical Liquid Deposition. PLD  thin film deposition method using liquid precursot. e.g. photoresist; liquid is physically transferred from the source to the substrate wafer.
mist deposition  deposition technique in which liquid precursor is delivered to the substrate in the form of a very fine mist (submicron droplets); in semiconductor manufacturing used to deposit very thin photoresist films and dielectrics; very useful in those applications in which spin-on process cannot be used, e.g. depositions on very large and/or heavy substrates.

Reference: Primaxx, Inc.
spin-on deposition, spin coating  process used to coat the wafer with material which is originally in the liquid form; liquid is dispensed onto the wafer surface in predetermined amount and the wafer is rapidly rotated (up to 6000 rpm; during spinning liquid is uniformly distributed on the surface by centrifugal forces; material is then solidified by low temperature (typically <200 oC) bake; in semiconductor processing commonly used to apply photoresist.
Hit Count=

Back To Top! 

Back To Home!







Hit Count=
Created and operated by J. Ruzyllo. Copyright J. Ruzyllo 2001-2016. All rights reserved.

Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.