Semiconductor Glossary, Developed Semi OneSource.
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With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.


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Including some 500 new terms defined and remaining terms updated and modified, a 2nd edition book version of this glossary is now available.


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Term (Index) Definition
PRE  particle removal efficiency; expressed in %; often related to a particle size range; needs to be close to 100% for the particle removal method to be considered effective.
particle  pieces of various materials (dust, ultra-small chips of silicon or silica, skin flakes, colonies of bacteria, etc.) present in the process environment; even ultra-small particles(<0.1 micrometer) on the Si surface may cause catastrophic damage; no effort is spared to prevent particle contamination (clean-room technology); most commonly particles are removed by an APM clean.
particle removal  process designed to remove particles from the wafer surface; carried out using wet cleaning (APM) with megasonic agitation; particle removal in the gas phase is less effective.
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Jerzy Ruzyllo is a Distinguished Professor Emeritus in the Department of Electrical Engineering at Penn State University.



This book gives a complete account of semiconductor engineering covering semiconductor properties, semiconductor materials, semiconductor devices and their uses, process technology, fabrication processes, and semiconductor materials and process characterization.


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Created and operated by J. Ruzyllo. Copyright J. Ruzyllo 2001-2016. All rights reserved.

Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.