Semiconductor Glossary, Developed Semi OneSource.

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With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.


Including some 500 new terms defined and remaining terms updated and modified, a 2nd edition book version of this glossary is now available.

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Term (Index) Definition
NGL  Next Generation Lithography; term refers to lithography techniques that will be considered for mass production of state-of-the art integrated circuits after further improvements to the photolithography based on 193 nm exposure wavelenght won't be possible; Extreme UV (EUV) lithography, X-Ray lithography, E-Beam lithography, nano-printing belong to this category.
Term (Index) Definition
NGL, Next Generation Lithography  meaning of the term evolves with time following changes in the lithographic techniques.
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Jerzy Ruzyllo is a Distinguished Professor Emeritus in the Department of Electrical Engineering at Penn State University.

This book gives a complete account of semiconductor engineering covering semiconductor properties, semiconductor materials, semiconductor devices and their uses, process technology, fabrication processes, and semiconductor materials and process characterization.

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Created and operated by J. Ruzyllo. Copyright J. Ruzyllo 2001-2016. All rights reserved.

Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.