Semiconductor Glossary, Developed Semi OneSource.
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With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.












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Term (Index) Definition
MERIE  Magnetically Enhanced RIE; reactive ion etching process in which plasma is confined by magnetic field; what results is an increase of the ionization efficiency producing denser plasma, increased etch rate and reduced surface damage.
HDP, High Density Plasma  high density plasma - plasma featuring high concentration of free electrons, and hence, high concentration of ions.
magnetically confined plasma  plasma in which magnetic field is used to confine electrons in the plasma and by doing so to increase ionization efficiency.
Reactive Ion Etching, RIE  variation of plasma etching in which during etching semiconductor wafer is placed on the RF powered electrode; wafer takes on potential which accelerates etching species extracted from plasma toward the etched surface; chemical etching reaction is preferentially taking place in the direction normal to the surface, i.e. etching is more anisotropic than in plasma etching but is less selective; leaves etched surface damaged; the most common etching mode in semiconductor manufacturing.
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Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.