Semiconductor Glossary, Developed Semi OneSource.
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With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.


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Including some 500 new terms defined and remaining terms updated and modified, a 2nd edition book version of this glossary is now available.


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Term (Index) Definition
ICP  Inductively Coupled Plasma; high density plasma used in semiconductor processing; etching in particular.
HDP, High Density Plasma  high density plasma - plasma featuring high concentration of free electrons, and hence, high concentration of ions.
Term (Index) Definition
ICP MS  Inductively Coupled Plasma Mass Spectroscopy; a method allowing identification of species adsorbed on the surface of the wafer; commonly used to detect organic surface contaminants which are thermally desorbed and then identified by analyzing plasma emission spectrum.
GC - MS, gas chromatography  Gas Chromatography Mass Spectroscopy; in solid-state technology used to study species adsorbed on solid surfaces (desorption + analysis by MS); in semiconductor practice technique used to detect organic contaminants on silicon surface.
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Jerzy Ruzyllo is a Distinguished Professor Emeritus in the Department of Electrical Engineering at Penn State University.



This book gives a complete account of semiconductor engineering covering semiconductor properties, semiconductor materials, semiconductor devices and their uses, process technology, fabrication processes, and semiconductor materials and process characterization.


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Created and operated by J. Ruzyllo. Copyright J. Ruzyllo 2001-2016. All rights reserved.

Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.