Semiconductor Glossary, Developed Semi OneSource.
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With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.












Including some 500 new terms defined and remaining terms updated and modified, a 2nd edition book version of this glossary is now available.


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Term (Index) Definition
ICP  Inductively Coupled Plasma; high density plasma used in semiconductor processing; etching in particular.
HDP, High Density Plasma  high density plasma - plasma featuring high concentration of free electrons, and hence, high concentration of ions.
Term (Index) Definition
ICP MS  Inductively Coupled Plasma Mass Spectroscopy; a method allowing identification of species adsorbed on the surface of the wafer; commonly used to detect organic surface contaminants which are thermally desorbed and then identified by analyzing plasma emission spectrum.
GC - MS, gas chromatography  Gas Chromatography Mass Spectroscopy; in solid-state technology used to study species adsorbed on solid surfaces (desorption + analysis by MS); in semiconductor practice technique used to detect organic contaminants on silicon surface.
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Created and operated by J. Ruzyllo. Copyright J. Ruzyllo 2001-2016. All rights reserved.

Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.