Semiconductor Glossary, Developed Semi OneSource.
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With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.


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Including some 500 new terms defined and remaining terms updated and modified, a 2nd edition book version of this glossary is now available.


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Term (Index) Definition
HIPOX  High Pressure OXidation; thermal oxidation carried out at the pressure of oxidizing ambient significantly higher than atmospheric pressure (e.g. 25 atm.); allows fast growth of an oxide at reduced temperature; allows oxidation of nitride covered silicon surface resulting in nitrogen-rich layer near the surface of the oxide.
thermal oxidation, thermal oxide  growth of native oxide of the solid through oxidation of solid's surface at elevated temperature; results from chemical reaction of host atoms with oxygen containing ambient; thermal oxidation of silicon results in a very high quality silicon dioxide, SiO2, formed on the silicon surface; most other semiconductors do not form device quality thermal oxide, hence, term "thermal oxidation" is almost synonymous with "thermal oxidation of silicon".

Reference: Thermal oxidation of silicon.
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Jerzy Ruzyllo is a Distinguished Professor Emeritus in the Department of Electrical Engineering at Penn State University.



This book gives a complete account of semiconductor engineering covering semiconductor properties, semiconductor materials, semiconductor devices and their uses, process technology, fabrication processes, and semiconductor materials and process characterization.


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Created and operated by J. Ruzyllo. Copyright J. Ruzyllo 2001-2016. All rights reserved.

Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.