Semiconductor Glossary, Developed Semi OneSource.
Google
 


Check out the new SemiconductorGlossary.com weBLOG!

Semiconductor Glossary book, click here to see new prices!


With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.












Including some 500 new terms defined and remaining terms updated and modified, a 2nd edition book version of this glossary is now available.


Search For Term

Term (Index) Definition
Fixed Shape Beam, FSB  as opposed to variable shape beam; technical concept in the area of e-beam lithoraphy.
electron beam (e-beam) lithography, EBL  lithography technique which uses focused beam of electrons to expose the resist; no mask is used as pattern is "written" directly into the resist by very fast scanning of electron beam; pattern transfer resolution below 100 nm; resolution is limited by the proximity effect; EBL is commonly used to manufacture high resolution masks for photolithography and X-ray lithography.
variable shape beam  scanning mode in e-beam lithography in which shape of the beam is changing depending on the geometry of exposed area.
Hit Count=

Back To Top! 

Back To Home!







Hit Count=
Created and operated by J. Ruzyllo. Copyright J. Ruzyllo 2001-2016. All rights reserved.

Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.