Semiconductor Glossary, Developed Semi OneSource.
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With over 2000 terms defined and explained, Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.












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Term (Index) Definition
EUV, extreme UV  extremely short wavelength (typically shorter than about 180 nm) UV radiation; sometime also referred to as a "soft X-ray"; used in photolithography to exposed ultra-small (below 100 nm) geometries; as opposed to conventional photolithography in which optical lenses are used to direct and shape the light beam, the EUV photolithography uses very high precision mirrors for the same purpose; also different mask design is needed.
deep UV, DUV  refers to very short wavelength UV radiation(200 - 300 nm); typically associated with 248 nm wavelength generated by KrF excimer laser.
photolithography, optical lithography  pattern definition method which uses UV radiation to expose the resist; the most common lithography technique in semiconductor manufacturing; using extremely short wavelength UV (extreme UV; wavelenghts below 200 nm), projection printing (steppers), phase shift masks, and adequate resist technology photolithography is capable of resolution below 100 nm.
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Created and operated by J. Ruzyllo. Copyright J. Ruzyllo 2001-2016. All rights reserved.

Information in this glossary is provided at the author's discretion. Any liability based on, or related to the contents of this glossary is disclaimed.